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Title: | INVESTIGATION OF EEDF AND ELECTRON DENSITY AND TEMPERATURE BY DEVELOPED LANGMUIR PROBE IN RF-CCP ARGON DISCHARGE AND CORRELATION WITH OES |
Authors: | Djelloul MENDIL, Hadj LAHMAR, Laïd HENNI, Mounes ALIM, Djelloul LOUHIBI ,Karim HENDA |
Keywords: | cylindrical Langmuir probe RF-CCP plasma discharge (13.56 MHz) RF compensation EEDF |
Issue Date: | 22-Dec-2013 |
Series/Report no.: | 2011; |
Abstract: | The Langmuir probe, which was introduced for the first time by Langmuir and Mott-Smith [1], is a powerful mean for measuring the plasma parameters in low-pressure discharges. It allows a direct, local and absolute measurement of all plasma parameters (electron density and temperature, floating and plasma potential, and energy electron distribution function (EEDF). A single rf-compensated cylindrical Langmuir probe has been developed in order to characterise a plasma RF discharge. Compensated measurements of EEDF and plasma parameters were conducted at powers ranging from 5 to 120 W and pressure of 0.3 mbar. The electronic density increases from 1.5×109 to 3.2×1010 cm-3 while the effective electron temperature decreases from 3.7 to 2.5 eV and then stabilizes beyond 70 W. They exhibit a transition between α and γ mode. The EEDFs were found to be Druyvesteyn-like below 70 W and then evolve to the Maxwellian beyond 70 W. OES method was applied to correlate with our Langmuir probe measurement. The intensities of the emission line at 7500 Å and 5145 Å follow the variation of ne with power density, and then show a transition regime at the same power as the previous case. |
Description: | SIPP 2011 UKM Ouargla 13 15 Fevrier 2011 |
URI: | http://hdl.handle.net/123456789/3726 |
ISSN: | gs |
Appears in Collections: | 1. Faculté des mathématiques et des sciences de la matière |
Files in This Item:
File | Description | Size | Format | |
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Djelloul MENDIL.pdf | 721,88 kB | Adobe PDF | View/Open |
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