Déposition de couches minces par pulvérisation cathodique et mesure par éllipsométrie

Abstract

Thin films are used in many fields. To control and to improve the quality of these materials, we need to know their characteristics. We are interested in the calculation of the optical properties of materials (refractive index, extinction coefficient, dielectric permittivity and the thickness of these films) using the principle of an efficient optic method: the ellipsometry method. We have calculated these properties based on the principle of polarization of light on a sample material and using the basic equation of ellipsometry. Using experimental curves of ellipsometric angles (.Δ) as a function of the wavelength, our numerical program calculate optical properties. The obtained results, for Cu, Ag, Al and Si, are in good agreement with the results of other works.