Cr-N THIN FILMS PREPARED BY REACTIVE RF MAGNETRON SPUTTERING

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DC Field	Value	Language
dc.contributor.author	E.H. BOUDJEMA , L. AISSANI	-
dc.date.accessioned	2013-12-22T11:46:22Z	-
dc.date.available	2013-12-22T11:46:22Z	-
dc.date.issued	2011-02-15	-
dc.identifier.issn	gs	-
dc.identifier.uri	http://hdl.handle.net/123456789/3733	-
dc.description	SIPP 2011 UKM Ouargla 13 15 Fevrier 2011	en_US
dc.description.abstract	Chromium Nitride thin films Cr-N have been deposited on carbon steel substrates by r.f. magnetron sputtering using a pure Cr target. In order to generate nitriding process of Cr, Ar and N2 gas mixing in different ratios of Ar/ N2 was used. To characterize Cr-N thin films, composition and structural properties were determined respectively by EDS (Energy Dispersive Spectroscopy) analysis and X ray diffraction (XRD). Hardness and Young modulus were also measured. SEM images were used to determine surface morphology of produced Cr-N thin films	en_US
dc.language.iso	en	en_US
dc.relation.ispartofseries	2011;	-
dc.subject	plasma	en_US
dc.subject	steel	en_US
dc.subject	annealing treatment	en_US
dc.subject	thin film	en_US
dc.subject	chromium nitride	en_US
dc.title	Cr-N THIN FILMS PREPARED BY REACTIVE RF MAGNETRON SPUTTERING	en_US
dc.type	Article	en_US
Appears in Collections:	1. Faculté des mathématiques et des sciences de la matière

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