Etude des spectres d’émission d’ions d’argon lors de déposition sur couches minces dans un pulvérisateur cathodique magnétron

Abstract

This study is devoted to the study of spectroscopy in discharge plasmas during deposition of thin films by RF magnetron sputtering. The chamber sputtering contains a target of Nylon 6.6 (Good Fellow). The study relates to electronic transitions of atoms and ions of argon, nitrogen molecules and nitrogen ions in plasma and determination of electron temperature and electron density of the plasma. The characterization of plasma indicates that the plasma discharge is not at local thermodynamic equilibrium. The results of our calculations are consistent with the experimental results of J. Kousal and al. (2009) [1].