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dc.contributor.advisorM.T. MEFTAH-
dc.contributor.authorZ. BALLAH-
dc.contributor.authorF. KHELFAOUI-
dc.date.accessioned2009-
dc.date.available2009-
dc.date.issued2009-
dc.identifier.issn2170-0672-
dc.identifier.urihttp://dspace.univ-ouargla.dz/jspui/handle/123456789/6428-
dc.descriptionAST Annales des Sciences et Technologieen_US
dc.description.abstractTo study the electric properties of Argon plasma used in deposition of thin silicon films by the process of magnetron sputtering with a radiofrequency of 13.5 MHz , we have applied the model of fluids for a stationary one dimensional system. The properties calculated are the electronic density, the ionic density, the electrical field and the electrical potential. This model is based on the electronic continuity equation, the ionic continuity equation and Poisson's equation. We applied these results on the Langmuir probe to find the characteristic current-voltage.en_US
dc.language.isofren_US
dc.relation.ispartofseriesvolume 1 numéro 3 AST 2009;-
dc.subjectPlasmaen_US
dc.subjectmagnetron sputteringen_US
dc.subjectLangmuir probeen_US
dc.subjectelectrical propertiesen_US
dc.titleMODELISATION NUMERIQUE DES PROPRIETES ELECTRIQUES DANS UN PULVERISATEUR CATHODIQUE MAGNETRONen_US
dc.typeArticleen_US
Appears in Collections:volume 1 numéro 3 AST 2009

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