Simulation Monte Carlo de réactions chimiques dans le volume d'un réacteur PECVD lors de déposition d'une couche

Abstract

This work presents a Monte Carlo Simulation (MCS) of chemical reactions that occur in the volume of a PECVD reactor during deposition of a-C:H thin film elaborated from (CH4/H2) mixture. Besides CH4 and H2, molecules and radicals taken in account in this study are CH3, CH2, CH, C2H5, C2H6 and H. The MCS is based on binary collisions. MCS allowed us to obtain the densities and the molecular fractions of different particles and other parameters related to reaction rates. The results are in good agreement with other works.