Cr-N THIN FILMS PREPARED BY REACTIVE RF MAGNETRON SPUTTERING

Abstract

Chromium Nitride thin films Cr-N have been deposited on carbon steel substrates by r.f. magnetron sputtering using a pure Cr target. In order to generate nitriding process of Cr, Ar and N2 gas mixing in different ratios of Ar/ N2 was used. To characterize Cr-N thin films, composition and structural properties were determined respectively by EDS (Energy Dispersive Spectroscopy) analysis and X ray diffraction (XRD). Hardness and Young modulus were also measured. SEM images were used to determine surface morphology of produced Cr-N thin films